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CPD96V(2006) データシート - Central Semiconductor

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CPD96V

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Central-Semiconductor
Central Semiconductor Central-Semiconductor

PROCESS DETAILS
   Process EPITAXIAL PLANAR
   Die Size 20 x 20 MILS
   Die Thickness 7.1 MILS
   Anode Bonding Pad Area 16 x 16 MILS
   Top Side Metalization Al - 20,000Å
   Back Side Metalization Au - 12,000Å


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