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ADG467BRS データシートの表示(PDF) - Analog Devices

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ADG467BRS
ADI
Analog Devices ADI
ADG467BRS Datasheet PDF : 16 Pages
First Prev 11 12 13 14 15 16
TRENCH ISOLATION
The MOS devices that make up the channel protector are
isolated from each other by an oxide layer (trench) (see Figure 26).
When the NMOS and PMOS devices are not electrically
isolated from each other, parasitic junctions between CMOS
transistors may cause latch-up. Latch-up is caused when P-N
junctions that are normally reverse biased become forward
biased, causing large currents to flow, which can be destructive.
ADG467
CMOS devices are normally isolated from each other by
junction isolation. In junction isolation, the N and P wells of the
CMOS transistors form a diode that is reverse biased under
normal operation. However, during overvoltage conditions, this
diode becomes forward biased. A silicon-controlled rectifier
(SCR) type circuit is formed by the two transistors causing a
significant amplification of the current that, in turn, leads to
latch-up. With trench isolation, this diode is removed; the result
is a latch-up-proof circuit.
VG
VG
VSx
VDx
VSx
VDx
T
R
P+
E
N
C
H
N
P-CHANNEL
P+
T
R
N+
E
N
C
H
P
BURIED OXIDE LAYER
N-CHANNE L
SUBSTRATE (BACKGATE)
Figure 26. Trench Isolation
N+
T
R
E
N
C
H
Rev. B | Page 11 of 16

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